One of the types of vacuum coating machines——magnetron sputtering
What is magnetron sputtering?
Magnetron sputtering is a type of Physical Vapor Deposition (PVD).
The general sputtering method can be used to prepare multiple materials such as metals, semiconductors, and insulators, and has the advantages of simple equipment, easy control, large coating area and strong adhesion.
The magnetron sputtering method developed in the 1970s achieved high speed, low temperature, and low damage. Because high-speed sputtering is performed under low pressure, the ionization rate of the gas must be effectively increased. Magnetron sputtering introduces a magnetic field on the surface of the target cathode and uses the magnetic field to confine the charged particles to increase the plasma density to increase the sputtering rate.
Features: The equipment is simple, easy to control, and the coating area is large.